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PVD Target Cooling: Direct or indirect?
PVD coating causes heat. Cooling can be done directly or indirectly. The table compares both methods.
Process Control in PVD Coating – Stable Reactive Sputtering with Speedflo and Optix
Why Process Control Is Essential in PVD In plasma and vacuum technology, precise process control is a key success factor. In reactive sputtering, instabilities occur when the gas flow rate reaches the range of stoichiometric film compositions. Without effective control, identical process parameters can produce very different outcomes – such as variations in reactive gas partial pressure, target voltage, or deposition rate. The result: inconsistent film quality, higher scrap r


Use Case Rübig - Faster to a new PVD system with monitoring tools
How the use of modern vacuum monitoring and control devices accelerates and simplifies the development of a new generation of PVD systems. STARTING SITUATION Rübig Anlagentechnik is introducing a new PVD system series to the market, which is equipped with HiPIMS-ready planar sputtering magnetrons. The systems are inherently suitable for metallic and reactive processes. CHALLENGE What did RUBIG see as the biggest challenges in the development of the coater and the new proc


Solutions for Large-Area-Coating
Large-area (LAC) coating technology is crucial in modern manufacturing. It enables the deposition of functional thin films across...


Ion sources - improving coating quality, adhesion, and control
Authors: Dr. Patrick McCarthy (GENCOA), Thomas Vartiainen (AVALUXE) Ion sources are important components in physical vapor deposition...


Controlling reactive processes: Challenges and solution by reactive gas controller
Authors: Dr. Joseph Brindley GENCOA and Dr. Anas Ghailane (AVALUXE) Reactive Magnetron Sputtering In reactive magnetron sputtering,...


Increasing margins in PVD with innovative technology and materials
Well-established deposition technologies like ARC or materials like AlTi/TiAl deliver solid results, but it is hard to differentiate...


Cylindrical cathodes for PVD coating
In the context of physical vapor deposition (PVD), "cylindrical cathode PVD" typically refers to a configuration used for the deposition...


How to make life easier for a PVD operator: Why and how to monitor gas in vacuum
Monitoring gas in a vacuum chamber is important for several reasons: Identifying problems early before they affect the process and...


R&D market cluster arrangement solutions - Design and options
Introduction Sputtering systems for universities, R&D departments and small batch coating facilities usually look very much alike:...


ADVANCED ENERGY decision tree for power supplies
If you need help for your decision on which power supply will be the best for your PVD process please check out this chart.
Wissenswertes: Blog2
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