PVD coating causes heat. Cooling can be done directly or indirectly. The table compares both methods.

Why Process Control Is Essential in PVD In plasma and vacuum technology, precise process control is a key success factor. In reactive sputtering, instabilities occur when the gas flow rate reaches the range of stoichiometric film compositions. Without effective control, identical process parameters can produce very different outcomes – such as variations in reactive gas partial pressure, target voltage, or deposition rate. The result: inconsistent film quality, higher scrap r

How the use of modern vacuum monitoring and control devices accelerates and simplifies the development of a new generation of PVD systems. STARTING SITUATION Rübig Anlagentechnik is introducing a new PVD system series to the market, which is equipped with HiPIMS-ready planar sputtering magnetrons. The systems are inherently suitable for metallic and reactive processes. CHALLENGE What did RUBIG see as the biggest challenges in the development of the coater and the new proc

Large-area (LAC) coating technology is crucial in modern manufacturing. It enables the deposition of functional thin films across...