Pulsed DC systems
Enhance Deposition Rates
and Improve Film Flatness
Extend process innovation with Advanced Energy's comprehensive pulsed-DC suite.
Minimize arcing, enhance deposition rate, improve film flatness and packing density.
Ascent AP Series
Unprecedented Power Control for Single- and Dual-Magnetron Sputtering
Ascent® AP power supplies deliver unprecedented plasma control in a compact solution for single-magnetron and dual-magnetron sputtering.
Advanced Energy's patented pulsing technology enables remarkable arc prevention, higher power levels, and increased throughput.
Ascent AP's comprehensive control parameters and wide operational range unlock material options to extend process flexibility and material innovation.
Achieve new levels of process performance using field-proven, bipolar DC pulsing technology.
Advanced waveform control allows process fine-tuning
Available for both dual-pulsed and single-pulsed magnetron sputtering applications
Compact design incorporates DC and pulsing
Precise sputtering of dielectric and conductive films
Extended process control and flexibility
High film quality and throughput
Repeatable, customizable films
Higher power levels with reduced arc damage
Easy integration and control
Process customization with extensive power delivery parameters
Advanced process management through a tiered approach to arc mitigation
Compact, single-unit solution (up to 30 kW)
Set Point Compensation ™ technology for stable throughput
Wide operational range to enable a variety of process materials
Flat panel display
Pinnacle Plus +
Process-Proven, Pulsed DC for Single-Magnetron Reactive Sputtering of Thin Dielectric Films
Advanced Energy Pinnacle® Plus + power supplies provide all the advantages of a pulsed-DC solution for reactive processes - in an easily integrated package that increases process efficiency, reduces costs, and offers superior flexibility and latitude.
Combining standard DC technology and our patented pulsed-DC technology, the Pinnacle Plus + power supplies provide higher deposition rates, more repeatable performance, and exceptional film quality compared to complicated and expensive AC-power solutions.
Pinnacle Plus + generators deliver DC power in a pulsing configuration enabling reactive sputtering of extremely uniform, high-quality dielectric films.
Charge clearing during the reverse pulse prevents arcs from developing
Adjustable process through frequency and duty cycle control
Compact air-cooled design expandable in primary / secondary configurations
Higher deposition and yield rates
Superior film uniformity and quality
Reduced substrate damage caused by arcing
Excellent process flexibility and latitude
Flat panel displays
Arc bias Solvix
An Arc-Bias Solution that Brings a New Level of Precision and Productivity to Cathodic Arc Processes
Powerful arc discharges, rapid vaporization of target material, and high-energy ions make cathodic arc deposition both powerful and potentially unstable.
Available at a range of current levels up to 400 A, Solvix® arc supplies deliver excellent plasma ionization, ion energy, and throughput - with remarkable power and process control. Solvix supplies add an even greater degree of control over film properties, for remarkably hard, dense, durable, adherent films.
Solvix power supplies are specifically designed to enable advanced, high-tech coatings.
New coating capabilities with precision bias generators
Industry-leading reliability while powering extremely dynamic ARC processes
System optimization with a wide variety of models available
Reduced substrate damage and better yield
Excellent film density and adhesion
Proven reliability and high throughput
Adaptability to a wide range of process requirements
Efficient installation and support