RF Match Networks
Obtain Fast, Accurate, and Reliable Matching
Enable fast, accurate, and reliable matching. Advanced Energy's match networks expertly perform in multiple power ranges.
Available in plug-and-play models or configurable units, easily install, expedite tuning, and tighten process control.
Navigator II
Rapid, Accurate, and Reliable Digitally-Tuned Matching
The Navigator® ll is equipped with microprocessor-controlled, stepper-motor drives, and advanced tuning algorithms - enabling optimized RF power.
An optional internal Z'Scan® II RF sensor provides real-time analysis of process power and impedance - allowing you to quickly identify and significantly reduce process variability.
Optional Virtual Front Panel software is available for monitoring and control through a user's computer.
DESCRIPTION
The Navigator ll matching network's advanced digital technology speeds tuning and match response time.
Leading RF plasma methodology and control
Advanced pulsing control with tune-while-pulsing capability
Unprecedented insights into plasma with the integrated Z'Scan II
BENEFITS
Speedily tune and improve match response time
Tighten process control
Increase tool throughput and product yield
Improve reliability and cost of ownership
Customize across a variety of chambers and processes
FEATURES
Digital architecture with model-based rapid tuning algorithms
Pulsed RF power delivery
Sweep frequency operation
Intermodulation distortion (IMD) immunity for multi-frequency applications
Real-time process power and impedance measurement
APPLICATIONS
Etch
Flat panel displays
Semiconductor Manufacturing
Navigator II FCi
Agile, Precise Power Delivery for Demanding High-Speed Matching Applications
The Navigator® II FCi is a standalone, microprocessor-controlled impedance matching network. Incorporating tuning elements adjusted by discrete solid-state switched capacitor arrays, the matching network is driven by the need to achieve fast, accurate tuning across wider impedances. With a similar form, footprint, and tuning ranges as traditional counterparts, these matches offer tuning times in the millisecond range compared with the one-second range typical of traditional matching networks.
This high-speed matching technology is optimized and suited for critical, power sensitive, short duration plasma process steps such as Atomic Layer Etch (ALE).
When configured for full-range tuning, the Navigator FCi can cover an impedance space identical to that of a vacuum capacitor match. The compactness of solid-state circuitry allows the match to fit within a similar footprint of the conventional version.
This match has no moving mechanical parts, eliminating wear and drift mechanisms inherent to traditional matches. This enables higher reliability and repeatability on a broad range of challenging and continually varying plasma processes.
DESCRIPTION
Advanced Energy's Navigator II FCi enables improved process control with precise power delivery and tuning.
The high-speed matching network is optimized for critical, power sensitive, short duration plasma process steps. Conventional longer steps and wide tuning range, traditionally handled by vacuum capacitor-based matching networks, are also supported.
Through high-speed tuning, the Navigator II FCi offers many process control enhancements.
Reduced plasma stabilization time
No plasma dropout between process recipe transitions
BENEFITS
Achieve fast, accurate tuning across a wide impedance range
Improve reliability and repeatability
Reduce power delivery interruption and "winking-out" of plasma
Use technology for short process steps, such as ALE applications
FEATURES
13.56 MHz
CW and pulse operation
Output measurement sensor
Air cooled
APPLICATIONS
Semiconductor Manufacturing
Etch
Navio
Economical, Digital, Configurable Matching Network Solution
Experience simplicity and high reliability in a single, affordable package. The Navio ™ matching network leverages our power expertise to precisely match complex plasma impedance to your tuning range. It's quick, accurate, and repeatable.
Available in multiple power ranges and frequencies, choose from a standard offering or a configurable design. Installation is virtually plug-and-play with Advanced Energy's RF power supplies.
Virtual front panel software is available for monitoring.
DESCRIPTION
The Navio matching network delivers quick, accurate, and repeatable impedance across many applications.
Plug-and-play installation with Advanced Energy's RF power supplies for thin film applications
Efficient and stable power delivery
Compact and air-cooled (standard package or slim version)
BENEFITS
Improve throughput, increase yield, and reduce production costs
Choose a standard model or configure a unit that meets your system requirements
Install and operate with ease
Obtain excellent repeatability for high process yield
APPLICATIONS
Deposition
Etch
Flat panel display
Glass coating
Industrial coatings
Semiconductor Manufacturing
Solar photovoltaics